Blank Cover Image

Mask characterization for double patterning lithography

Author(s):
  • K. Bubke ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
  • E. Cotte ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
  • J. H. Peters ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
  • R. de Kruif ( ASML Netherlands B.V., Netherlands )
  • M. Dusa ( ASML US, Inc., USA )
Publication title:
Photomask technology 2007
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6730
Pub. Year:
2007
Vol.:
1
Page(from):
67301H-1
Page(to):
67301H-10
Pages:
10
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819468871 [0819468878]
Language:
English
Call no.:
P63600/6730
Type:
Conference Proceedings

Similar Items:

R. de Kruif, K. Bubke, G.-J. Janssen, E. van der Heijden, J. Fochler

Society of Photo-optical Instrumentation Engineers

J. Finders, M. Dusa, B. Vleeming, H. Megens, B. Hepp

Society of Photo-optical Instrumentation Engineers

W. H. Arnold, M. Dusa, J. Flinders

SPIE - The International Society of Optical Engineering

M. Saito, M. Itoh, O. Ikenaga, K. Ishigo

Society of Photo-optical Instrumentation Engineers

Bubke, K., Alles, B, Cotte, E., Sczyrba, M., Pierrat, C.

SPIE - The International Society of Optical Engineering

Cotte, E., Selle, M., Bubke, K., Teuber, S.

SPIE - The International Society of Optical Engineering

M. Dusa, J. Quaedackers, O. F. A. Larsen, J. Meessen, E. van der Heijden, G. Dicker, O. Wismans, P. de Haas, K. van I. …

SPIE - The International Society of Optical Engineering

Vandenberghe,G., Marschner,T., Ronse,K., Socha,R.J., Dusa,M.V.

SPIE - The International Society for Optical Engineering

T. Kamikubo, R. Nishimura, K. Tsuruta, K. Hattori, J. Takamatsu

Society of Photo-optical Instrumentation Engineers

Bubke, K., Sczyrba, M., Park, K. T., Neubauer, R., Pforr, R., Reichelt, J., Ziebold, R.

SPIE - The International Society of Optical Engineering

H. Sunaoshi, T. Kamikubo, R. Nishimura, K. Tsuruta, T. Katsumata

Society of Photo-optical Instrumentation Engineers

K. R. Kimmel, I. Hoellein, J. H. Peters, P. Ackmann, B. Connolly

Society of Photo-optical Instrumentation Engineers

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12