Mask characterization for double patterning lithography
- Author(s):
- K. Bubke ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
- E. Cotte ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
- J. H. Peters ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
- R. de Kruif ( ASML Netherlands B.V., Netherlands )
- M. Dusa ( ASML US, Inc., USA )
- Publication title:
- Photomask technology 2007
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6730
- Pub. Year:
- 2007
- Vol.:
- 1
- Page(from):
- 67301H-1
- Page(to):
- 67301H-10
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819468871 [0819468878]
- Language:
- English
- Call no.:
- P63600/6730
- Type:
- Conference Proceedings
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