Mask characterization for double patterning lithography

Mask characterization for double patterning lithography

Author(s):

K. Bubke ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
E. Cotte ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
J. H. Peters ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
R. de Kruif ( ASML Netherlands B.V., Netherlands )
M. Dusa ( ASML US, Inc., USA )

Publication title:

Photomask technology 2007

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6730

Pub. Year:

2007

Vol.:

1

Page(from):

67301H-1

Page(to):

67301H-10

Pages:

10

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

Language:

English

Call no.:

P63600/6730

Type:

Conference Proceedings

Details

TDL ID:	ZA00052371
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Photomask Technology 2007
Conf. info. (Number):	2007
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2007.09.18-2007.09.21
Note for article:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 12. Extreme NA (6730-52)

Similar Items:

1 Conference Proceedings Wafer based mask characterization for double patterning lithography R. de Kruif, K. Bubke, G.-J. Janssen, E. van der Heijden, J. Fochler Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings Double patterning for 32nm and below: an update J. Finders, M. Dusa, B. Vleeming, H. Megens, B. Hepp Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Metrology challenges of double exposure and double patterning W. H. Arnold, M. Dusa, J. Flinders SPIE - The International Society of Optical Engineering	8 Conference Proceedings Mask image position correction for double patterning lithography M. Saito, M. Itoh, O. Ikenaga, K. Ishigo Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Pellicle-induced aberrations and apodization in hyper NA optical lithography [6283-115] Bubke, K., Alles, B, Cotte, E., Sczyrba, M., Pierrat, C. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Study of stress birefringence for 1 93-nm immersion photomasks [5853-02] Cotte, E., Selle, M., Bubke, K., Teuber, S. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Pitch doubling through dual-patterning lithography challenges in integration and litho budgets M. Dusa, J. Quaedackers, O. F. A. Larsen, J. Meessen, E. van der Heijden, G. Dicker, O. Wismans, P. de Haas, K. van I. … SPIE - The International Society of Optical Engineering	10 Conference Proceedings CD control comparison for sub-0.18-ｦﾌm patterning using 248-nm lithography and strong resolution enhancement techniques Vandenberghe,G., Marschner,T., Ronse,K., Socha,R.J., Dusa,M.V. SPIE - The International Society for Optical Engineering
5 Conference Proceedings Coping with double-patterning/exposure lithography by EB mask writer EBM-6000 T. Kamikubo, R. Nishimura, K. Tsuruta, K. Hattori, J. Takamatsu Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Image degradation due to phase effects in chromeless phase lithography [6349-38] Bubke, K., Sczyrba, M., Park, K. T., Neubauer, R., Pforr, R., Reichelt, J., Ziebold, R. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Key improvement schemes of accuracies in EB mask writing for double patterning lithography H. Sunaoshi, T. Kamikubo, R. Nishimura, K. Tsuruta, T. Katsumata Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings Optimal mask characterization by Surrogate Wafer Print (SWaP) method K. R. Kimmel, I. Hoellein, J. H. Peters, P. Ackmann, B. Connolly Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12