Investigation of mask defectivity in full field EUV lithography

Investigation of mask defectivity in full field EUV lithography

Author(s):

R. Jonckheere ( IMEC vzw, Belgium )
F. Iwamoto ( IMEC vzw, Belgium )
G. F. Lorusso ( IMEC vzw, Belgium )
A. M. Goethals ( IMEC vzw, Belgium )
K. Ronse ( IMEC vzw, Belgium )

Publication title:

Photomask technology 2007

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6730

Pub. Year:

2007

Vol.:

1

Page(from):

673012-1

Page(to):

673012-12

Pages:

12

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

Language:

English

Call no.:

P63600/6730

Type:

Conference Proceedings

Details

TDL ID:	ZA00052371
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Photomask Technology 2007
Conf. info. (Number):	2007
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2007.09.18-2007.09.21
Note for article:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 9. EUV and OGL (6730-37)

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