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Litho-aware extraction for the 32nm double patterning node

Author(s):
  • J. Huckabay ( Cadence Design Systems, Inc., USA )
  • Q. Chen ( Cadence Design Systems, Inc., USA )
  • C. Thayer ( Cadence Design Systems, Inc., USA )
  • R. Naber ( Cadence Design Systems, Inc., USA )
Publication title:
Photomask technology 2007
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6730
Pub. date:
2007
Vol.:
1
Page(from):
67300W-1
Page(to):
67300W-12
Pages:
12
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819468871 [0819468878]
Language:
English
Call no.:
P63600/6730
Type:
Conference Proceedings

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