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The advanced mask CD MTT control using dry etch process for sub 65 nm tech

Author(s):
  • S. J. Jo ( Hynix Semiconductor Inc., South Korea )
  • H. Y. Jung ( Hynix Semiconductor Inc., South Korea )
  • D. W. Lee ( Hynix Semiconductor Inc., South Korea )
  • J. C. Shin ( Hynix Semiconductor Inc., South Korea )
  • J. Y. Jun ( Hynix Semiconductor Inc., South Korea )
Publication title:
Photomask technology 2007
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6730
Pub. Year:
2007
Vol.:
1
Page(from):
673008-1
Page(to):
673008-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819468871 [0819468878]
Language:
English
Call no.:
P63600/6730
Type:
Conference Proceedings

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