Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

Author(s):

S. Handa ( Osaka Univ. (Japan) )
H. Mimura ( Osaka Univ. (Japan) )
S. Matsuyama ( Osaka Univ. (Japan) )
H. Yumoto ( Osaka Univ. (Japan) )
T. Kimura ( Osaka Univ. (Japan) )

Publication title:

Advances in metrology for x-ray and EUV optics II : 30 August 2007, San Diego, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6704

Pub. Year:

2007

Page(from):

670404-1

Page(to):

670404-8

Pages:

8

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468529 [0819468525]

Language:

English

Call no.:

P63600/6704

Type:

Conference Proceedings

Details

TDL ID:	ZA00052350
Series ID:	PA00000029
Conf. info. (Name):	SPIE Optical Engineering and Applications : Advances in Metrology for X-Ray and EUV Optics
Conf. info. (Number):	2007 : 2nd
Conf. info. (Venue):	San Diego, California, USA
Conf. info. (Date):	2007.08.30
Note for article:	Advances in Metrology for X-Ray and EUV Optics II, August 30, 2007, San Diego, CA, USA - Session 1 (6704-03)

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