Light-emitting and Structural Properties of Si-rich HfO2 Thin Films Fabricated by RF Magnetron Sputtering

Light-emitting and Structural Properties of Si-rich HfO₂ Thin Films Fabricated by RF Magnetron Sputtering

Author(s):

D. Khomenkov ( Taras Shcvchenko National University of Kyiv, Kyiv, Ukraine )
Y.-T. An ( CIMAP/ENSICAEN/UCBN, France )
X. Portier
C. Labbe
F. Gourbilleau

Publication title:

Low-dimensional semiconductor structures : symposium held August 11-15, 2013, Cancún, México

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

1617

Pub. Year:

2013

Page(from):

85

Page(to):

91

Pages:

7

Pub. info.:

Warrendale, Pa: Materials Research Society

ISSN:

02729172

ISBN:

9781605115948 [1605115940]

Language:

English

Call no.:

M23500/1617

Type:

Conference Proceedings

Details

TDL ID:	ZA00052297
Series ID:	PA00000011
Conf. info. (Name):	Low-Dimensional Semiconductor Structures
Conf. info. (Number):	2013
Conf. info. (Venue):	Cancun, Mexico
Conf. info. (Date):	2013.08.11-2013.08.15
Note for article:	XXII International Materials Research Congress, Symposium 7E and Symposium 6B August 11-15, 2013, Cancun, Mexico ; SI based materials

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