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Passivation of Silicon Surfaces by Formation of Thin Silicon Oxide Films Formed by Combination of Induction-Coupled Remote Oxygen Plasma with High Pressure H2O Vapor Heat Treatment

Author(s):
Publication title:
Amorphous and polycrystalline thin-film silicon science and technology - 2012 : symposium held April 9-13, 2012, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
1426
Pub. Year:
2012
Page(from):
289
Page(to):
294
Pages:
6
Pub. info.:
Warrendale, PA: Materials Research Society
ISSN:
02729172
ISBN:
9781605114033 [1605114030]
Language:
English
Call no.:
M23500/1426
Type:
Conference Proceedings

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