Growth Characteristics of Electrochemically Deposited Cu2O Thin Films onto Pt/SiO2/Si Substrate by Galvanostatic Technique

Growth Characteristics of Electrochemically Deposited Cu₂O Thin Films onto Pt/SiO₂/Si Substrate by Galvanostatic Technique

Author(s):

Publication title:

Chemical solution deposition of semiconducting and non-metallic films : proceedings of the International Symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2003-32

Pub. Year:

2003

Page(from):

225

Page(to):

229

Pages:

5

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566774338 [1566774330]

Language:

English

Call no.:

E23400/200332

Type:

Conference Proceedings

Details

TDL ID:	ZA00051858
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Chemical Solution Deposition of Semiconducting and Non-Metallic Films Symposium
Conf. info. (Number):	1st

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