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Reliability and Plasma-Induced Degradation of High-K Gate Dielectrics in MOS Devices

Author(s):
Publication title:
Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2002-28
Pub. Year:
2002
Page(from):
149
Page(to):
156
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773959 [1566773954]
Language:
English
Call no.:
E23400/200228
Type:
Conference Proceedings

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