Blank Cover Image

Performance Impact of silicided Source/Drain/Gate on Deep Submicron CMOS Circuits

Author(s):
Publication title:
Proceedings of the Symposia on Interconnects, Contact Metallization, and Multilevel Metallization and Reliability for Semiconductor Devices, Interconnects, amd Thin Insulator Materials
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1993-25
Pub. Year:
1993
Page(from):
268
Page(to):
274
Pages:
7
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770675 [156677067X]
Language:
English
Call no.:
E23400/940140
Type:
Conference Proceedings

Similar Items:

Wang, L. K., Acovic, A., Chang, W. H.

MRS - Materials Research Society

Lu,W.-L., Lo,J.-C., Chang,T.-H.

SPIE - The International Society for Optical Engineering

Suguro, K., Iinuma, T., Ohuchi, K., Miyashita, K., Akutsu, H., Yoshimura, H., Akasaka, Y., Nakajima, K., Miyano, K., …

MRS - Materials Research Society

Lim,C.W,, Lahiri,S.K., Tung,C.H., Wong,S.M., Lee,K.H., Wong,H., Pey,K.L., Chan,L.H.

SPIE-The International Society for Optical Engineering

K. Yoshimoto, Y. Omura, H. Wakabayashi

Electrochemical Society

Han, L.K, Wang, H.H., Yoon, G.W., Allman, D., Kwong, D.L.

Electrochemical Society

Hong,Y.E., Keshavarzi,A., Tay,M.T.W.

SPIE-The International Society for Optical Engineering

Hu,J.C., Hong,Q.-Z., Kittl,J.A., Rodder,M., Chen,I.-C.

SPIE-The International Society for Optical Engineering

Huang, T. Y., Tsai, C. C., Wu, I. W., Lewis, A. G., Chiang, A., Bruce, R. H.

Materials Research Society

Lii, T., Park, E., Lutz, J., Wu, W., Simpson, L., Mui, D.

Electrochemical Society

E. Johnson, E. Nowak, C. Wang

Society of Photo-optical Instrumentation Engineers

S. Mertens, Y. Cho, F. Nouri, R. Schreutelkamp, Y. Kim, P. Verheyen, J. Steenbergen, C. Vrancken, H. Bender, O. Richard, …

Electrochemical Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12