Blank Cover Image

Chemical Vapor Deposition of Copper From a Stabilized Precursor Using Liquid Coinjection

Author(s):
Publication title:
Proceedings of the Symposia on Interconnects, Contact Metallization, and Multilevel Metallization and Reliability for Semiconductor Devices, Interconnects, amd Thin Insulator Materials
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1993-25
Pub. Year:
1993
Page(from):
225
Page(to):
234
Pages:
10
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770675 [156677067X]
Language:
English
Call no.:
E23400/940140
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings VAPOR DEPOSITION OF PARYLENE FILMS FROM PRECURSORS

You, L., Yang, G.-R., Lang, C-I., Wu, P., Moore, J.A., McDonald, J.F., Lu, T.-M.

Materials Research Society
7 Conference Proceedings KINETICS OF CHEMICAL VAPOR DEPOSITION OF COOPER FROM (β-diketonate) CuL PRECURSORS

Jain, Ajay, Chi, K M., Kodas, T. T., Hampden-smith, M. J.

Materials Research Society
2 Conference Proceedings CONSECUTIVE SELECTIVE CHEMICAL VAPOR DEPOSITION OF COPPER AND ALUMINUM FROM ORGANOMETALLIC PRECURSORS

Fine, Stephen M., Dyer, Paul N., Norman, John A.T.

Materials Research Society
8 Conference Proceedings PASSIVATION OF SILICON DIOXIDE SURFACE HYDROXYL GROUPS TO CONTROL SELECTIVITY DURING CHEMICAL VAPOR DEPOSITION OF COPPER FROM COPPER(I) COMPOUNDS

Jain, Ajay, Farkas, J., Kodas, T. T., Hampden-Smith, M. J., Gelatos, A. V., Marsh, R., Mogab, C. J.

MRS - Materials Research Society
3 Conference Proceedings Metallorganic Chemical Vapor Deposition of Ir Films With Iridium Acetylacetonate and Carbonyl Precursors

Sun, Y-M., Endle, J., Smith, K., Ekerdt, J. G., Hance, R. L., Alluri, P., White, J. M.

MRS - Materials Research Society
9 Conference Proceedings Oxidation Resistance of Copper Alloy Thin Films Formed by Chemical Vapor Deposition

Atanasova, P., Bhaskaran, V., Kodas, T., Hampden-Smith, M.

MRS - Materials Research Society
4 Conference Proceedings Characteristics of Cu-Pd Films Grown by Simultaneous Chemical Vapor Deposition from Metalorganic Precursors

Bhaskaran, V., Atanasova, P., Hampden-Smith, M. J., Kodas, T. T.

MRS - Materials Research Society
10 Conference Proceedings Oxidation Resistance of Copper Alloy Thin Films Formed by Chemical Vapor Deposition

Atanasova, P., Bhaskaran, V., Kodas, T., Hampden-Smith, M.

MRS - Materials Research Society
5 Conference Proceedings ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION OF COPPER FROM A NEW ORGANOMETALLIC PRECURSOR

Fine, Stephen M., Dyer, Paul N., Norman, John A.T., Muratore, Beth A., Iampietro, Robert L.

Materials Research Society
11 Conference Proceedings Synthesis and Decomposition Kinetics of Liquid Precursors for Chemical Vapor Deposition (CVD) of Barium

Gordon, R.G., Barry, S.T., Broomball-Dillard, R.N.R., DiCeglie, Jr.N., Liu, X., Teff, D.J.

Electrochemical Society
6 Conference Proceedings CHEMICAL VAPOR DEPOSITION OF COPPER FROM METAL-ORGANIC COPPER ( I ) PHOSPHINE COMPLEXES

Shin, H. -K., Hampden-Smith, M. J., Kodas, T. T., Duesler, E.. N., Farr, J. D., Paffett, M.

Materials Research Society
12 Conference Proceedings Copper-Barrier and Hard-Mask Elaboration by Plasma-Enhanced Chemical Vapor Deposition Using Organosilane Precursors

Remiat, B., Fusalba, F., Maury, P., Jousseaume, V., Lecornec, C., Gaillard, F., Durand, J.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12