Effect of Substrate Temperature on Hardness and Transparency of SiOC(–H) Thin Films Synthesized by Atmospheric Pressure Plasma Enhanced CVD Method

Effect of Substrate Temperature on Hardness and Transparency of SiOC(–H) Thin Films Synthesized by Atmospheric Pressure Plasma Enhanced CVD Method

Author(s):

Mayui Noborisaka

Publication title:

Amorphous and polycrystalline thin-film silicon science and technology--2011 : symposium held April 25-29, 2011, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

1321

Pub. Year:

2012

Page(from):

217

Page(to):

222

Pages:

6

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781605112985 [1605112984]

Language:

English

Call no.:

M23500/1321

Type:

Conference Proceedings

Details

TDL ID:	ZA00050363
Series ID:	PA00000011
Conf. info. (Name):	MRS Spring Meeting
Conf. info. (Number):	2011
Conf. info. (Venue):	San Francisco, California, USA
Conf. info. (Date):	2011.04.25-2011.04.29

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