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Deposition of p-Type Nanocrystalline Silicon Using High Pressure in a VHF-PECVD Single Chamber System

Author(s):
Xiaodan Zhang
Guanghong Wang
Xinxia Zheng
Shengzhi Xu
Changchun Wei
Jian Sun
Xinhua Geng
Shaozhen Xiong
Ying Zhao
4 more
Publication title:
Amorphous and polycrystalline thin-film silicon science and technology--2011 : symposium held April 25-29, 2011, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
1321
Pub. date:
2012
Vol.:
1321
Page(from):
393
Page(to):
398
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781605112985 [1605112984]
Language:
English
Call no.:
M23500/1321
Type:
Conference Proceedings

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