High Rate Deposition of Cluster-Suppressed Amorphous Silicon Films Deposited Using a Multi-Hollow Discharge Plasma CVD

High Rate Deposition of Cluster-Suppressed Amorphous Silicon Films Deposited Using a Multi-Hollow Discharge Plasma CVD

Author(s):

Publication title:

Photovoltaic materials and manufacturing issues II : symposium held November 29-December 3, Boston, Massachusetts, U.S.A

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

1210

Pub. Year:

2010

Page(from):

217

Page(to):

222

Pages:

6

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781605111834 [160511183X]

Language:

English

Call no.:

M23500/1210

Type:

Conference Proceedings

Details

TDL ID:	ZA00050324
Series ID:	PA00000011
Conf. info. (Name):	MRS Fall Meeting
Conf. info. (Number):	2009
Conf. info. (Venue):	Boston, Massachusetts, U.S.A.
Conf. info. (Date):	2009.11.29-2009.12.03

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