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Atmospheric Pressure Plasmas for Crystalline Silicon Photovoltaics

Author(s):
  • V. Hopfe ( Fraunhofer Institut für Werkstoff- und Strahltechnik (IWS), Dresden, Germany )
  • D.W. Sheel ( CVD Technologies Ltd., Manchester, United Kingdom )
  • R. Moeller ( Centrotherm Photovoltaics GmbH & Co. KG, Blaubeuren, Germany )
Publication title:
51st annual technical conference proceedings, April 19-24, 2008, Chicagom, IL
Title of ser.:
Annual Technical Conference of Society of Vacuum Coaters
Ser. no.:
51
Pub. date:
2008
Vol.:
51
Page(from):
123
Page(to):
133
Pages:
11
Pub. info.:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
Language:
English
Call no.:
A63930/51
Type:
Conference Proceedings

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