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Rate Enhancement in High Power Pulsed Magnetron Sputtering Growth using Secondary Discharge Confinement

Author(s):
S. Sevvana ( Department of Mechanical Engineering, University of Nebraska, Lincoln, NE )
S. Chennadi ( Department of Mechanical Engineering, University of Nebraska, Lincoln, NE )
R.K. Lakkaraju ( Department of Mechanical Engineering, University of Nebraska, Lincoln, NE )
J. Li ( Department of Mechanical Engineering, University of Nebraska, Lincoln, NE )
D.M. Mihut ( Department of Mechanical Engineering, University of Nebraska, Lincoln, NE )
S.L. Rohde ( Department of Mechanical Engineering, University of Nebraska, Lincoln, NE )
1 more
Publication title:
48th annual technical conference proceedings, April 23-28, 2005, Denver, Colorado
Title of ser.:
Annual Technical Conference of Society of Vacuum Coaters
Ser. no.:
48
Pub. Year:
2005
Page(from):
720
Page(to):
725
Pages:
6
Pub. info.:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
Language:
English
Call no.:
A63930/48
Type:
Conference Proceedings

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