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Gas Barrier Silica Films Deposited on Polyethyleneterephtalate by Low-Temperature Plasma-Enhanced CVD Using Organosilane Sources

Author(s):
  • K. Teshima ( Nagoya University, Nagoya, Japan and Dai Nippon Printing, Kashiwa, Japan )
  • Y. lnoue ( Nagoya University, Nagoya, Japan )
  • H. Sugimura ( Nagoya University, Nagoya, Japan )
  • O. Takai ( Nagoya University, Nagoya, Japan )
Publication title:
45th annual technical conference proceedings, April 13-18, 2002, Lake Buena Vista, Florida
Title of ser.:
Annual Technical Conference of Society of Vacuum Coaters
Ser. no.:
45
Pub. date:
2002
Vol.:
45
Page(from):
565
Page(to):
569
Pages:
5
Pub. info.:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
Language:
English
Call no.:
A63930/45
Type:
Conference Proceedings

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