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Comparison of SiOxNy Thin Films Deposited by ECR-PECVD at 2.4 and 3.0 mTorr Total Pressure

Author(s):
  • J. Wojcik ( McMaster University, Hamilton, Ontario, Canada )
  • L. Chan ( McMaster University, Hamilton, Ontario, Canada )
  • W.N. Lennard ( The University of Western Ontario, London, Ontario, Canada )
  • J.A. Davies ( McMaster University, Hamilton, Ontario, Canada )
  • P. Mascher ( McMaster University, Hamilton, Ontario, Canada )
Publication title:
45th annual technical conference proceedings, April 13-18, 2002, Lake Buena Vista, Florida
Title of ser.:
Annual Technical Conference of Society of Vacuum Coaters
Ser. no.:
45
Pub. Year:
2002
Page(from):
558
Page(to):
560
Pages:
3
Pub. info.:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
Language:
English
Call no.:
A63930/45
Type:
Conference Proceedings

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