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Dynamic Behavior of Unipolar and Bipolar Pulsed Magnetron Sputtering

Author(s):
  • M. List ( Fraunhofer Institut für Elektronenstrahl-und Plasmatechnik, Dresden, Germany )
  • U. Krause ( Fraunhofer Institut für Elektronenstrahl-und Plasmatechnik, Dresden, Germany )
  • T. Wünsche ( Fraunhofer Institut für Elektronenstrahl-und Plasmatechnik, Dresden, Germany )
Publication title:
44th Annual Technical Conference proceedings, April 21-26, 2001, Philadelphia, Pennsylvania
Title of ser.:
Annual Technical Conference of Society of Vacuum Coaters
Ser. no.:
44
Pub. Year:
2001
Page(from):
246
Page(to):
254
Pages:
9
Pub. info.:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
Language:
English
Call no.:
A63930/44
Type:
Conference Proceedings

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