Ion Implantation for LOW-Resistive Source/Drain Contacts in Finfet Devices

Ion Implantation for LOW-Resistive Source/Drain Contacts in Finfet Devices

Author(s):

Mark J. H. van Dal

Publication title:

Doping engineering for front-end processing : symposium held March 25-27, 2008, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

1070

Pub. Year:

2008

Page(from):

67

Page(to):

78

Pages:

12

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781605110400 [160511040X]

Language:

English

Call no.:

M23500/1070

Type:

Conference Proceedings

Details

TDL ID:	ZA00049373
Series ID:	PA00000011
Conf. info. (Name):	MRS Spring Meeting
Conf. info. (Number):	2008
Conf. info. (Venue):	San Francisco, California, U.S.A.
Conf. info. (Date):	2008.05.25-2008.05.27

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