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Low Temperature Synthesis of Nanocrystalline Silicon and Silicon Oxide Films by Plasma Chemical Vapor Deposition

Author(s):
Atsushi Tomyo
Hirokazu Kaki
Eiji Takahashi
Tsukasa Hayashi
Kiyoshi Ogata
Yukiharu Uraoka
1 more
Publication title:
Amorphous and polycrystalline thin-film silicon science and technology--2008 : symposium held March 25-28, 2008, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
1066
Pub. date:
2008
Vol.:
1066
Page(from):
167
Page(to):
172
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781605110363 [1605110361]
Language:
English
Call no.:
M23500/1066
Type:
Conference Proceedings

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