Plasma Etching Technology for Low-k Porous SiOCH Films
- Author(s):
- M. Hori
- Publication title:
- Silicon nitride, silicon dioxide, and emerging dielectrics 9
- Title of ser.:
- ECS transactions
- Ser. no.:
- 6(3)
- Pub. Year:
- 2007
- Page(from):
- 485
- Page(to):
- 500
- Pages:
- 16
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566775526 [1566775523]
- Language:
- English
- Call no.:
- E23400/6-3
- Type:
- Conference Proceedings
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