Blank Cover Image

Selective Si:C Epitaxy in Recessed Areas and Characterization of the Material Properties

Author(s):
Y. Kim
Z. Ye
A. Lam
A. Zojaji
Y. Cho
S. Kuppurao
1 more
Publication title:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment
Title of ser.:
ECS transactions
Ser. no.:
6(1)
Pub. Year:
2007
Page(from):
409
Page(to):
418
Pages:
10
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
19385862
ISBN:
9781566775502 [1566775507]
Language:
English
Call no.:
E23400/6-1
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Application of Selective Si:C Epitaxy For Recessed Source/Drain Technology

Y. Kim, Z. Ye, A. Zojaji, A. Lam, E. Sanchez

Electrochemical Society
7 Conference Proceedings LASER SELECTIVE AREA EPITAXY FOR THE POTENTIAL OF OPTOELECTRONIC INTEGRATION

Liu, H., Roberts, J.C., Ramdani, J., Bedair, S.M.

Materials Research Society
2 Conference Proceedings Low Temperature Selective Si and Si-Based Alloy Epitaxy For Advanced Transistor Applications

Yihwan Kim, Ali Zojaji, Zhiyuan Ye, Andrew Lam, Nicholas Dalida, Errol Sanchez, Satheesh Kuppurao

Materials Research Society
8 Conference Proceedings Synthesis and Characterization of LiNi0.5-xMn1.5-yMx+yO4 for 5V Cathode Material by Mechanochemical Process

S. Oh, S. Jeon, C. Kim, W. Cho, B. Cho

Electrochemical Society
3 Conference Proceedings Integrating Selective Epitaxy in Advanced Logic & Memory Devices

S. Kuppurao, Y. Kim, Y. Cho, S. Chopra, Z. Ye

Electrochemical Society
9 Conference Proceedings Growth and characterization of InGaN/GaN heterostructures using plasma-assisted molecular beam epitaxy

Shim, K. H., Hong, S. E., Kim, K. H., Paek, M. C., Cho, K. I.

MRS-Materials Research Society
4 Conference Proceedings Heavily Phosphorus Doped Silicon Junctions for nMOS Applications

S. Chopra, Z. Ye, A. Zojaji, Y. Kim, S. Kuppurao

Electrochemical Society
10 Conference Proceedings Optimization of optical properties of silicon-based anti-reflective spin-on hardmask materials

S. K. Kim, H. M. Cho, C. Woo, S. R. Koh, M. Kim

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Fabrication and Characterization of Triangular Shaped InGaAs/GaAs Quantum Wire Structures Using Selective Area Epitaxy

Kim, S.-I., Park, Y.K., Kim, Y.T., Tan, H.H., Jagadish, C.

Electrochemical Society
11 Conference Proceedings Growth and Properties of III-V Semiconductors by Molecular Beam Epitaxy

Cho A .Y.

Martinus Nijhoff Publishers
6 Conference Proceedings (3.2) 3.50 - 4:20 PM - Application of Selective SiGe Epitaxy for Recessed Source/Drain of PMOS Transistor (Invited)

Kim, Y., Samoilov, A., Washington, L., Lam, A., Dalida, N., Kawaguchi, M., Shen, M.(Applied Materials)

Electrochemical Society
12 Conference Proceedings (238d) Effect of Process Parameters and Characterization of the Properties of Pyrolytic SiC in VHTR Fuel Particles

Yeon-Ku Kim, Weon-Ju Kim, Woog-Ki Kim, Kyung-Chai Jeong, Moon-Sung Cho

American Institute of Chemical Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12