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Enhanced Dielectric Constant of HfO₂ and Al₂O₃ Thin-Films with Silver Nanoparticles

Author(s):
K. Ravindran
M. Othman
M. Yun
N. Biswas
N. Mehta
S. Guha
K. Gangopadhyay
S. Gangopadhyay
3 more
Publication title:
Physics and technology of high-k gate dielectrics 4
Title of ser.:
ECS transactions
Ser. no.:
3(3)
Pub. date:
2006
Page(from):
535
Page(to):
544
Pages:
10
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566775038 [1566775035]
Language:
English
Call no.:
E23400/3-3
Type:
Conference Proceedings

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