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Towards the Fabrication of Ultra-Thin SOI on Si (001) using Epitaxial Oxide and Epitaxial Semiconductor Growth Processes

Author(s):
D. Lichtenwalner
J. M. Hydrick
V. Vankova
V. Misra
J. Maria
A. I. Kingon
1 more
Publication title:
Physics and technology of high-k gate dielectrics 4
Title of ser.:
ECS transactions
Ser. no.:
3(3)
Pub. date:
2006
Page(from):
449
Page(to):
462
Pages:
14
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566775038 [1566775035]
Language:
English
Call no.:
E23400/3-3
Type:
Conference Proceedings

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