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Current Challenges in Ge MOS Technology

Author(s):
A. Dimoulas
M. Houssa
A. Ritenour
J. Fompeyrine
W. Tsai
J. Seo
Y. Panayiotatos
P. Tsipas
D. P. Brunco
M. R. Caymax
J. Locquet
C. Dieker
7 more
Publication title:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment
Title of ser.:
ECS transactions
Ser. no.:
3(2)
Pub. Year:
2006
Page(from):
371
Page(to):
384
Pages:
14
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
19385862
ISBN:
9781566775021 [1566775027]
Language:
English
Call no.:
E23400/3-2
Type:
Conference Proceedings

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