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On the Growth of Native Oxides on Hydrogen-Terminated Silicon Surfaces in Dark and Under Illumination with Light

Author(s):
A. Y. Kovalgin
A. Zinine
R. Bankras
H. Wormeester
B. Poelsema
J. Schmitz
1 more
Publication title:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment
Title of ser.:
ECS transactions
Ser. no.:
3(2)
Pub. Year:
2006
Page(from):
191
Page(to):
202
Pages:
12
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
19385862
ISBN:
9781566775021 [1566775027]
Language:
English
Call no.:
E23400/3-2
Type:
Conference Proceedings

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