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Silicon Self-Diffusion in Heavily B-Doped Si Using Highly Pure 30Si Epitaxial Layer

Author(s):
S. Matsumoto
S. R. Aid
S. Seto
K. Toyonaga
Y. Nakaboyashi
M. Sakuraba
Y. Shimamune
Y. Hashiba
J. Murota
K. Wada
T. Abe
6 more
Publication title:
Silicon materials science and technology X
Title of ser.:
ECS transactions
Ser. no.:
2(2)
Pub. Year:
2006
Page(from):
287
Page(to):
298
Pages:
12
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566774390 [156677439X]
Language:
English
Call no.:
E23400/2-2
Type:
Conference Proceedings

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