Scale-up of the BaTiO₃ ALD Process onto 200mm Wafer

Scale-up of the BaTiO₃ ALD Process onto 200mm Wafer

Author(s):

R. Matero

Publication title:

Atomic layer deposition : at the 208th ECS Meeting, October 16-21, 2005, Los Angeles, California, USA

Title of ser.:

ECS transactions

Ser. no.:

1(10)

Pub. Year:

2006

Page(from):

137

Page(to):

142

Pages:

6

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566774437 [1566774438]

Language:

English

Call no.:

E23400/1-10

Type:

Conference Proceedings

Details

TDL ID:	ZA00047104
Series ID:	PA00000034
Conf. info. (Name):	ECS Meeting
Conf. info. (Number):	208th
Conf. info. (Venue):	Los Angeles, California, USA
Conf. info. (Date):	2005.10.16-2005.10.21

Similar Items:

1 Conference Proceedings Atomic Layer Deposition of NbN and Nb(Si)N for Metal Electrodes H. Huotari, S. Haukka, R. Matero, A. Rahtu, E. Tois, M. Tuominen Electrochemical Society	7 Conference Proceedings High-k Oxides by Atomic Layer Chemical Vapour Deposition Tuominen, M., Kanniainen, T., Haukka, S. Electrochemical Society
2 Conference Proceedings High Growth Rate SiO₂ by Atomic Layer Deposition R. Matero, S. Haukka, M. Tuominen Electrochemical Society	8 Conference Proceedings Atomic Layer Deposition of Ruthenium from RuCp2 and Oxygen: Film Growth and Reaction Mechanism Studies Aaltonen, T., Rahtu, A., Ritala, M., Leskelae, M. Electrochemical Society
3 Conference Proceedings 57 High-k Dielectric Growth on Germanium by Atomic Layer Deposition Rahtu, A., Ralli, K., Putkonen, M., Tuominen, M., Haukka, S. Electrochemical Society	9 Conference Proceedings Atomic Layer Deposition of Thin Films for Microelectronics Ritala, M., Leskela, M. Electrochemical Society
4 Conference Proceedings Integration of a Quadrupole Mass Spectrometer and a Quartz Crystal Microbalance for In Situ Characterization of Atomic Layer Deposition Processes in Flow Type … Rahtu, A., Ritala, M. Electrochemical Society	10 Conference Proceedings Atomic Layer CVD For Continuously Shrinking Devices Haukka, S., Elers, K., Tuominen, M. Materials Research Society
5 Conference Proceedings Liquid Injection MOCVD and ALD Studies of 'Single Source' Sr-Nb and Sr-Ta Precursors Potter, Richard J., Marshall, Paul A., Roberts, John L., Jones, Anthony C., Chalker, Paul R., Vehkamaki, Marko, Ritala, … Materials Research Society	11 Conference Proceedings ALD Technology - Present and Future Challenges S. Haukka Electrochemical Society
6 Conference Proceedings Atomic Layer Deposition of Metal Oxide Films by using Metal Alkoxides as an Oxygen Source Raeisaenen, P.I., Kukli, K., Rahtu, A., Ritala, M., Leskela, M. Electrochemical Society	12 Conference Proceedings Iridium Barriers for Direct Copper Electrodeposition in Damascene Processing D. Josell, J. Bonevich, T. Moffat, T. Aaltonen, M. Ritala, M. Leskelä Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12