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Modeling and Engineering of Hafnium Silicate (HfSiO) Gate Dielectrics Deposited by Nano-Laminated Atomic-Layer Deposition (NL-ALD)

Author(s):
V. S. Chang
Y. Hou
P. Hau
P. Lim
L. Yao
F. Yen
C. Hung
H. Lin
J. Jiang
Y. Jin
C. Chen
H. Tao
S. Chen
S. Jang
M. Liang
10 more
Publication title:
Atomic layer deposition : at the 208th ECS Meeting, October 16-21, 2005, Los Angeles, California, USA
Title of ser.:
ECS transactions
Ser. no.:
1(10)
Pub. date:
2006
Page(from):
113
Page(to):
124
Pages:
12
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566774437 [1566774438]
Language:
English
Call no.:
E23400/1-10
Type:
Conference Proceedings

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