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Prospect of Hf-Dared Gate Dielectric by PVD with FUSI Gate for LSTP Application

Author(s):
M. Niwa
R. Mitsuhashi
S. Hayashi
K. Yamamoto
Y. Harada
M. Kubota
A. Rothchild
T. Hoffmann
S. Kubicek
S. DeGendt
M. Heyns
A. Lauwers
S. Biesemans
J. Kittle
9 more
Publication title:
Physics and technology of high-k gate dielectrics III
Title of ser.:
ECS transactions
Ser. no.:
1(5)
Pub. date:
2006
Page(from):
269
Page(to):
286
Pages:
18
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566774444 [1566774446]
Language:
English
Call no.:
E23400/1-5
Type:
Conference Proceedings

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