SELECTIVE ETCHING OF SiGe FOR REMOVAL OF DUMMY LAYERS IN FULLY SILICIDED GATE ARCHITECTURES
- Author(s):
J. Snow R. Vos K. G. Anil H. Kraus K. Xu F. Grinninger G. Wagner F. Kovacs P. W. Mertens - Publication title:
- Cleaning Technology in Semiconductor Device Manufacturing IX
- Title of ser.:
- ECS transactions
- Ser. no.:
- 1(3)
- Pub. Year:
- 2006
- Page(from):
- 207
- Page(to):
- 213
- Pages:
- 7
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566774291 [1566774292]
- Language:
- English
- Call no.:
- E23400/1-3
- Type:
- Conference Proceedings
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