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NANOSCALE PARTICLES REMOVAL ON AN EXTREME ULTRA-VIOLET LITHOGRAPHY (EUVL) MASK LAYER BY LASERSHOCK CLEANING

Author(s):
S.-H. Lee
S.-H Lee
J.-G. Park
A. A. Busnaina
J.-M. Lee
T.-H. Kim
G. Zhang
F. Eschbach
A. Ramamoorthy
4 more
Publication title:
Cleaning Technology in Semiconductor Device Manufacturing IX
Title of ser.:
ECS transactions
Ser. no.:
1(3)
Pub. Year:
2006
Page(from):
26
Page(to):
32
Pages:
7
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
19385862
ISBN:
9781566774291 [1566774292]
Language:
English
Call no.:
E23400/1-3
Type:
Conference Proceedings

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