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Wet-Cleaning and Surface Characterization of Si₁₋xGex Relaxed Alloys (x=0.2-0.5) After Polishing: Applications for SGOI and Strained Silicon Structures Elaboration

Author(s):
A. Abbadie
J. M. Hartmann
P. Besson
D. Rouchon
P. Holliger
C. Di Nardo
T. Lardin
Y. Campidelli
B. Ghyselen
T. Billon
5 more
Publication title:
State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLIII) and Nitride and Wide Bandgap Semiconductors for Sensors, Photonics, and Electronics VI
Title of ser.:
ECS transactions
Ser. no.:
1(2)
Pub. Year:
2006
Page(from):
130
Page(to):
132
Pages:
3
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566774314 [1566774314]
Language:
English
Call no.:
E23400/1-2
Type:
Conference Proceedings

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