Prospect of High-k/Metal Gate Stack Technology for Future CMOS Devices
- Author(s):
B. H. Lee P. Kirsch P. Majhi S. Song R. Chol N. Moumen G. Bersuker - Publication title:
- Physics and Chemistry of SiO2 and the Si-SiO2 Interface-5
- Title of ser.:
- ECS transactions
- Ser. no.:
- 1(1)
- Pub. Year:
- 2005
- Page(from):
- 29
- Page(to):
- 38
- Pages:
- 10
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566774307 [1566774306]
- Language:
- English
- Call no.:
- E23400/1-1
- Type:
- Conference Proceedings
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