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Low Temperature Epitaxy of n-Doped Silicon Thin Films Using Plasma Enhanced Chemical Vapor Deposition

Author(s):
Publication title:
Amorphous and polycrystalline thin-film silicon science and technology--2007 : symposium held April 9-13, 2007, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
989
Pub. Year:
2007
Page(from):
151
Page(to):
158
Pages:
8
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558999497 [1558999493]
Language:
English
Call no.:
M23500/989
Type:
Conference Proceedings

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