Simulation of Silicon Dioxide Deposition in a Vertical 300 mm LPCVD Furnace

Simulation of Silicon Dioxide Deposition in a Vertical 300 mm LPCVD Furnace

Author(s):

G. J. Schoof

C.R.Kleijn

H. E. A. Van den Akker

Publication title:

Computational technologies for fluid/thermal/structural/chemical systems with industrial applications : presented at the 2002 ASME Pressure Vessels and Piping Conference, Vancouver, British Columbia, Canada, August 5-9, 2002

Title of ser.:

Proceedings of the ASME Pressure Vessels and Piping Division

Ser. no.:

448

Pub. Year:

2002

Vol.:

448

Pt.:

v.1

Paper no.:

PVP2002-1541

Page(from):

101

Page(to):

112

Pages:

12

Pub. info.:

New York, N.Y.: American Society of Mechanical Engineers

ISBN:

9780791846599 [0791846598]

Language:

English

Call no.:

A11715

Type:

Conference Proceedings

Details

TDL ID:	ZA00046992
Series ID:	PA00000033
Conf. info. (Name):	ASME Pressure Vessels and Piping Conference
Conf. info. (Number):	2002
Conf. info. (Venue):	Vancouver, British Columbia, Canada
Conf. info. (Date):	2002.08.05-2002.08.09

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