A novel run-time MEEF-driven defect disposition extending high resolution contamination inspection to next generation photomask

A novel run-time MEEF-driven defect disposition extending high resolution contamination inspection to next generation photomask

Author(s):

W. Chou ( United Microelectronics Corp. (Taiwan) )

Y. -F. Cheng ( United Microelectronics Corp. (Taiwan) )

S. -M. Yen ( United Microelectronics Corp. (Taiwan) )

J. Cheng ( United Microelectronics Corp. (Taiwan) )

P. Peng ( United Microelectronics Corp. (Taiwan) )

J. Huang ( KLA-Tencor Corp. (USA) )

T. Huang ( KLA-Tencor Corp. (USA) )

D. Wang ( KLA-Tencor Corp. (USA) )

E. Chen ( KLA-Tencor Corp. (USA) )

C. Y. Hsiang ( KLA-Tencor Corp. (USA) )

K. Bhattacharyya ( KLA-Tencor Corp. (USA) )

A. Dayal ( KLA-Tencor Corp. (USA) )

7 more

Publication title:

Photomask and next-generation lithography mask technology XIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6607

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819467454 [0819467456]

Language:

English

Call no.:

P63600/6607

Type:

Conference Proceedings

Details

TDL ID:	ZA00046914
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2007 : 14th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2007.04.17-2007.04.19

Similar Items:

1 Conference Proceedings Automatic optimization of MEEF-driven defect disposition for contamination inspection challenges T. Huang, A. Dayal, K. Bhattacharyya, J. Huang, W. Chou Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings Improvement in defect classification efficiency by grouping disposition for reticle inspection [5992-11] Lai, R., Hsu, L. T. H., Chang, P., Ho, C. H., Tsai, F., Long, G., Yu, P., Miller, J., Hsu, V., Chen, E. SPIE - The International Society of Optical Engineering
2 Conference Proceedings A high-resolution contamination-mode inspection method providing a complete solution to the inspection challenges for advanced photomasks Bhattacharyya, K., Huang, Y.-T., Son, K., Wang, D., Liu, L., Liao, C.H., Dai, Y.-M., Lin, J.-C. SPIE - The International Society of Optical Engineering	8 Conference Proceedings A new generation of progressive mask defects in the pattern side of advenced photomasks [6281-24] Grenon, J. B., Bhattacharyya, K., Eynon, B. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Process window impact of progressive mask defects: its inspection and disposition techniques (go/no-go criteria) via a lithographic detector [5992-06] Huang, J., Peng, L. -H., Chu, C. -W, Bhattackharyya, K., Eynon, B., Mirzaagha, F., Dibiase, T., Son, K., Cheng, J., … SPIE - The International Society of Optical Engineering	9 Conference Proceedings WS-SP: a framework for multi-service provisioning in the next generation optical network X. Chen, J. Zhang, P. Jia, L. Wang, Y. Cheng Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings A new high-resolution photomask inspection system for contamination detection B. Mu, A. Dayal, L.-H. Yiin, J. Zhu, J. Miller Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Printability impact of progressive defects: ammonium sulfate emulation study B. Grenon, T. Huang, A. Dayal, K. Bhattacharyya Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Recipe optimization of fab mask inspection for 180 - 90 nm reticles to save inspection time and improve productivity E. H. Lu, C. Y. Hsiang, J. Wang, J. Zhu, E. Chen, K. Bhattacharyya SPIE - The International Society of Optical Engineering	11 Conference Proceedings Study of chromeless mask quartz defect detection capability for 80-nm post structure [6349-136] Lu, J., Wang, B., Chen, F. F., Wang, O., Chou, J., Lin, O., Cheng, J., Chen, E., Yu, P. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Controller-driven VRML animation of the next-generation inspection system (NGIS) real-time controller Stouffer,K., Horst,J.A. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Photomask defect tracing, analysis, and reduction with chemically amplified resist process Lin, C.-., Lai, R., Huang, W.H., Wang, B.C., Chen, C.Y., Kung, C.H., Yoo, C.-S., Chen, J.-J., Lee, S.-C. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12