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New PEC optimization for the mask fabrication of sub-50nm memory device

Author(s):
S. Lee ( Samsung Electronics Co., Ltd. (South Korea) )
D. Ryu ( Samsung Electronics Co., Ltd. (South Korea) )
J. Park ( Samsung Electronics Co., Ltd. (South Korea) )
D. Nam ( Samsung Electronics Co., Ltd. (South Korea) )
H. Kim ( Samsung Electronics Co., Ltd. (South Korea) )
B. Kim ( Samsung Electronics Co., Ltd. (South Korea) )
S. Woo ( Samsung Electronics Co., Ltd. (South Korea) )
H. Cho ( Samsung Electronics Co., Ltd. (South Korea) )
3 more
Publication title:
Photomask and next-generation lithography mask technology XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6607
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
Language:
English
Call no.:
P63600/6607
Type:
Conference Proceedings

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