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DFM based on layout restriction and process window verification for sub-60nm memory devices

Author(s):
S. -H. Choi ( Samsung Electronics Co., Ltd. (South Korea) )
D. -H. Jung ( Samsung Electronics Co., Ltd. (South Korea) )
J. -S. Hong ( Samsung Electronics Co., Ltd. (South Korea) )
J. -H. Choi ( Samsung Electronics Co., Ltd. (South Korea) )
M. -H. Yoo ( Samsung Electronics Co., Ltd. (South Korea) )
J. -T. Kong ( Samsung Electronics Co., Ltd. (South Korea) )
1 more
Publication title:
Photomask and next-generation lithography mask technology XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6607
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
Language:
English
Call no.:
P63600/6607
Type:
Conference Proceedings

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