Scatterometry based profile metrology of two-dimensional patterns of EUV masks

Scatterometry based profile metrology of two-dimensional patterns of EUV masks

Author(s):

I. Pundaleva ( Samsung Electronics Co., Ltd. (South Korea) )
R. Chalykh ( Samsung Electronics Co., Ltd. (South Korea) )
H. Kim ( Samsung Electronics Co., Ltd. (South Korea) )
B. Kim ( Samsung Electronics Co., Ltd. (South Korea) )
H. Cho ( Samsung Electronics Co., Ltd. (South Korea) )

Publication title:

Photomask and next-generation lithography mask technology XIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6607

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819467454 [0819467456]

Language:

English

Call no.:

P63600/6607

Type:

Conference Proceedings

Details

TDL ID:	ZA00046914
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2007 : 14th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2007.04.17-2007.04.19

Similar Items:

1 Conference Proceedings Simulation of critical dimension and profile metrology based on scatterometry method [6349-57] Chalykh, R., Pundaleva, I., Kim, S., Cho, H.-K., Moon, J.-T. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Numerical analysis of DUV scatterometry on EUV masks M. Wurm, B. Bodermann, R. Model, H. Gross SPIE - The International Society of Optical Engineering
2 Conference Proceedings Rigorous modeling and analysis of impact produced by microstructures in mask on wafer pattern fidelity I. Pundaleva, R. Chalykh, M. Lee, H. Kim, B. Kim Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings EUV mask making: an approach based on the direct patterning of the EUV reflector Chovino, C., Dieu, L., Johnstone, E., Reyes, J., La Fontaine, B.M., Levinson, H.J., Pawloski, A.R. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Overlay metrology for dark hard mask process: simulation and experiment study J. Shin, R. Chalykh, H. Kang, S. Kim, S. Lee, H. Cho SPIE - The International Society of Optical Engineering	9 Conference Proceedings Scatterometry-based overlay metrology Huang, H.-T., Raghavendra, G., Sezginer, A., Johnson, K., Stanke, F.E., Zimmerman, M.L., Cheung, C., Miyagi, M., Singh, … SPIE-The International Society for Optical Engineering
4 Conference Proceedings CD and profile metrology of EUV masks using scatterometry based optical digital profilometry [6349-92] Cho, S., Yedur, S., Kwon, M., Tabet, M. SPIE - The International Society of Optical Engineering	10 Conference Proceedings EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95] Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., … SPIE - The International Society of Optical Engineering
5 Conference Proceedings Image analysis of alignment and overlay marks with compound structure R. Chalykh, I. Pundaleva, J. Shin, S. Kim, H. Cho, J. Moon SPIE - The International Society of Optical Engineering	11 Conference Proceedings Phase-shift mask metrology using scatterometry S.M.G. Wilson, H.M. Marchman, S.S.H. Naqvi, J.R. McNeil Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Detailed analysis of capability and limitations of CD scatterometry measurements for 65- and 45-nm nodes I. Pundaleva, R. Chalykh, J. Lee, S. Choi, W. Han SPIE - The International Society of Optical Engineering	12 Conference Proceedings Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors La Fontaine, B., Pawloski, A.R., Deng, Y., Chovino, C., Dieu, L., Wood, O.R., II, Levinson, H.J. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12