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Full field EUV lithography turning into a reality at IMEC

Author(s):
R. Jonckheere ( IMEC (Belgium) )
G. F. Lorusso ( IMEC (Belgium) )
A. M. Goethals ( IMEC (Belgium) )
J. Hermans ( IMEC (Belgium) )
B. Baudemprez ( IMEC (Belgium) )
A. Myers ( IMEC (Belgium) )
I. Kim ( IMEC (Belgium) )
A. Niroomand ( IMEC (Belgium) )
F. Iwamoto ( IMEC (Belgium) )
N. Stepanenko ( IMEC (Belgium) )
K. Ronse ( IMEC (Belgium) )
6 more
Publication title:
Photomask and next-generation lithography mask technology XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6607
Pub. date:
2007
Vol.:
6607
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
Language:
English
Call no.:
P63600/6607
Type:
Conference Proceedings

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