Improvement of CD variation control for attenuated phase-shift mask

Improvement of CD variation control for attenuated phase-shift mask

Author(s):

M. Takagi ( Toppan Printing Co., Ltd. (Japan) )

T. Mizoguchi ( Toppan Printing Co., Ltd. (Japan) )

Y. Kojima ( Toppan Printing Co., Ltd. (Japan) )

T. Saga ( Toppan Printing Co., Ltd. (Japan) )

T. Haraguchi ( Toppan Printing Co., Ltd. (Japan) )

Y. Fukushima ( Toppan Printing Co., Ltd. (Japan) )

T. Tanaka ( Toppan Printing Co., Ltd. (Japan) )

Y. Okuda ( Toppan Printing Co., Ltd. (Japan) )

Y. Inazuki ( Shin-Etsu Chemical Co., Ltd. (Japan) )

H. Yoshikawa ( Shin-Etsu Chemical Co., Ltd. (Japan) )

S. Okazaki ( Shin-Etsu Chemical Co., Ltd. (Japan) )

6 more

Publication title:

Photomask and next-generation lithography mask technology XIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6607

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819467454 [0819467456]

Language:

English

Call no.:

P63600/6607

Type:

Conference Proceedings

Details

TDL ID:	ZA00046914
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2007 : 14th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2007.04.17-2007.04.19

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