Uniformity studies of inductively coupled plasma etching in fabrication of HgCdTe detector arrays

Uniformity studies of inductively coupled plasma etching in fabrication of HgCdTe detector arrays

Author(s):

R. Bommena ( EPIR Technologies, Inc. (USA) )

S. Velicu ( EPIR Technologies, Inc. (USA) )

P. Boieriu ( EPIR Technologies, Inc. (USA) )

T. S. Lee ( EPIR Technologies, Inc. (USA) )

C. H. Grein ( EPIR Technologies, Inc. (USA) )

K. K. Tedjojuwono ( NASA Langley Research Ctr. (USA) )

1 more

Publication title:

Infrared technology and applications XXXIII : 9-13 April 2007, Orlando, Florida, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6542

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466648 [0819466646]

Language:

English

Call no.:

P63600/6542

Type:

Conference Proceedings

Details

TDL ID:	ZA00046849
Series ID:	PA00000029
Conf. info. (Name):	Defense, Security, and Sensing : Infrared Technology and Applications
Conf. info. (Number):	2007 : 33rd
Conf. info. (Venue):	Orlando, Florida, USA
Conf. info. (Date):	2007.04.09-2007.04.13

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