Blank Cover Image

Mask qualification strategies in a wafer fab

Author(s):
  • C. Jaehnert ( Infineon Technologies Dresden GmbH & Co OHG (Germany) )
  • A. Kunowski ( Infineon Technologies Dresden GmbH & Co OHG (Germany) )
Publication title:
EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6533
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466556 [0819466557]
Language:
English
Call no.:
P63600/6533
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings A reticle quality management strategy in wafer fabs addressing progressive mask defect growth problem at low-k1 lithography

Bhattacharyya, K., Son, K., Eynon, B. G., Gudmundsson, D., Jaehnert, C., Uhlig, D.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings A reticle quality management strategy in wafer fabs addressing progressive mask defect growth problem at low k1 lithography [5853-33]

Bhattacharyya, K., Eickhoff, M., Ma, M., Pas, S.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Implementation of new reticle inspection technology for progressive mask defect detection strategy in wafer fabs

C. Liu, A. Lu, C. Wang, E. Guo, D. Fan

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings EHS Infrastructure Issues in Modern Wafer Fabs

Brown, P.T., Reblin, R., Heironimus, J., Nauert, C., Mendicino, L.

Electrochemical Society
3 Conference Proceedings Scatterometry on pelliclized masks: an option for wafer fabs

E. Gallagher, C. Benson, M. Higuchi, Y. Okumoto, M. Kwon, S. Yedur, S. Li, S. Lee, M. Tabet

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Reticle defect management solutions for a wafer fab

Muller, R.C., Scheid, G.W., Callan, N.P.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Wafer inspection as alternative approach to mask defect qualification

C. Holfeld, F. Katzwinkel, U. Seifert, A. Mothes, J. H. Peters

Society of Photo-optical Instrumentation Engineers
10 Conference Proceedings New approach to improve CD uniformity based on mask quality

Liebe,R., Jaehnert,C., Gottlib,G., Eran,Y., Hemar,S., Sade,A., Rosenbusch,A.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings High-resolution reticle inspection technique providing a complete reticle qualification solution in advanced 90-nm node wafer fabs

Liu, L., Liao, C.-H., Dai, Y.-M., Lin, J.-C., Bhattacharyya, K., Huang, Y.-T., Son, K., Wang, D.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Results of new mask contamination inspection capability STARlight2+ 72nm pixel for qualifying memory masks in wafer fabs

R. Dover, J. Zhu, N. Schmidt, M. Lang

Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Wafer fob mask qualification techniques and limitations [6349-30]

Poock, A., Maelzer, S., Spence, C., Tabery, C., Lang, M., Schnasse, G., Peikert, M., Bhattacharyya, K.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Die cost analysis through defect reduction for wafer fab equipment

Binjrajka,V., Jethani,C., Brown,S.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12