An empirical approach adressing the transfer of mask placement errors during exposure

An empirical approach adressing the transfer of mask placement errors during exposure

Author(s):

B. Alles ( Univ. of Technology Munich (Germany) )

B. Simeon ( Univ. of Technology Munich (Germany) )

E. Cotte ( Advanced Mask Technology Ctr. (Germany) )

T. Wandel ( Advanced Mask Technology Ctr. (Germany) )

B. Schulz ( AMD Saxony LLC (Germany) )

R. Seltmann ( AMD Saxony LLC (Germany) )

1 more

Publication title:

EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6533

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466556 [0819466557]

Language:

English

Call no.:

P63600/6533

Type:

Conference Proceedings

Details

TDL ID:	ZA00046840
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference
Conf. info. (Number):	2007 : 23rd
Conf. info. (Venue):	Grenoble, France
Conf. info. (Date):	2007.01.22-2007.01.25

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