OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes
- Author(s):
F. Sundermann ( STMicroelectronics (France) ) Y. Trouiller ( LETI-CEA (France) ) J. Urbani ( STMicroelectronics (France) ) C. Couderc ( NXP Semiconductors (France) ) J. Belledent ( NXP Semiconductors (France) ) A. Borjon ( NXP Semiconductors (France) ) F. Foussadier ( STMicroelectronics (France) ) C. Gardin ( Freescale Semiconductor, Inc. (France) ) L. LeCam ( NXP Semiconductors (France) ) Y. Rody ( NXP Semiconductors (France) ) M. Saied ( Freescale Semiconductor, Inc. (France) ) E. Yesilada ( Freescale Semiconductor, Inc. (France) ) C. Martinelli ( STMicroelectronics (France) ) B. Wilkinson ( Freescale Semiconductor, Inc. (France) ) F. Vautrin ( STMicroelectronics (France) ) N. Morgana ( Freescale Semiconductor, Inc. (France) ) F. Robert ( STMicroelectronics (France) ) P. Montgomery ( Freescale Semiconductor, Inc. (France) ) G. Kerrien ( STMicroelectronics (France) ) J. Planchot ( STMicroelectronics (France) ) V. Farys ( STMicroelectronics (France) ) J. D. Maria ( LETI-CEA (France) ) - Publication title:
- EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6533
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466556 [0819466557]
- Language:
- English
- Call no.:
- P63600/6533
- Type:
- Conference Proceedings
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