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Lithography and yield sensitivity analysis of SRAM scaling for the 32nm node

Author(s):
A. Nackaerts ( IMEC (Belgium) )
S. Verhaegen ( IMEC (Belgium) )
M. Dusa ( ASML Netherlands B.V. (Netherlands) )
H. Kattouw ( ASML Netherlands B.V. (Netherlands) )
F. van Bilsen ( ASML Netherlands B.V. (Netherlands) )
S. Biesemans ( IMEC (Belgium) )
G. Vandenberghe ( IMEC (Belgium) )
2 more
Publication title:
Design for manufacturability through design-process integration
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6521
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466402 [0819466409]
Language:
English
Call no.:
P63600/6521
Type:
Conference Proceedings

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