Three-dimensional mask effect approximate modeling for sub-50-nm node device OPC
- Author(s):
S. Suh ( Samsung Electronics Co., Ltd. (South Korea) ) S. Lee ( Samsung Electronics Co., Ltd. (South Korea) ) K. Back ( Samsung Electronics Co., Ltd. (South Korea) ) Y. Kim ( Samsung Electronics Co., Ltd. (South Korea) ) S. Kim ( Samsung Electronics Co., Ltd. (South Korea) ) Y. Chun ( Samsung Electronics Co., Ltd. (South Korea) ) - Publication title:
- Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6521
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466402 [0819466409]
- Language:
- English
- Call no.:
- P63600/6521
- Type:
- Conference Proceedings
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